Global Patent Grace Period Discussed at APEC IPEG
- Mar 5 2019 |
- Category: News
Ray Farrell was designated as a panel member by the American Intellectual Property Law Association (AIPLA) at the Asia Pacific Economic Cooperation (APEC) International Patent Experts Group (IPEG) meetings held in Santiago, Chile on February 26th. The format of the meetings were Grace Period Roundtable panel sessions organized by the USPTO and included representatives from U.S. Patent & Trademark Office, the Japan Patent Office, IP Australia, Department of IP-Thailand, Chinese Taipei, the International Federation of Intellectual Property Attorneys (FICPI) and AIPLA. The panel addressed the “Overview of International Substantive Patent Law Discussions”. Mr. Farrell, speaking on behalf of the AIPLA’s Patent Harmonization Committee, updated the APEC IPEG conference on the Industry Trilateral’s (industry organizations from the U.S., Europe and Japan) progress towards a balanced proposal by the Industry Trilateral and particularly as relates to grace periods for patent applicants who inadvertently disclose their inventions before filing a patent application.